High resolution 3D lithographic laser system, the Dilase 3D offers the possibility to work in 3 dimensions with a resolution of 5µm standard (until 2µm optional). It allows to write on all type of substrate (semi-conductor, glass, polymer, cristal, thin film…) on a surface expendable up to 100 x 100mm, and a depth of 50mm.
Dilase 3D brochureThe mask aligner UV-KUB 3 is the first mask alignment system equipped with a UV-LED light source, that provide an unrivalled collimation and homogeneous exposure, on the international market. Compact, easy to use and efficient, the mask alignment system UV-KUB 3 allows alignment up to 7" photolithography mask with substrates up to 6" in a cube volume of 48cm size. Thanks to its removable photomask holder, the handling of fragile mask is considerably reduced: you can change the substrate as often as you want without touching the photomask. Compatible with all standard photoresists: AZ, Shipley, SU8 and K-CL
https://www.kloe-france.com/sites/default/files/2024-Product-Sheet-UVKUB3.pdfThe exposure and masking system UV-KUB 2, available in 4" or 6" version, is the first UV-LED masking system available on the international market. The UV-KUB 2 is a compact exposure-masking system equipped with a LED based optical head, collimated and homogeneous. Its masking function enables to reach resolutions down to 2µm. This system is compatible with any of the most popular photoresists such as AZ series, Shipley series, SU-8 and K-CL series.
https://www.kloe-france.com/sites/default/files/2024-Product-Sheet-UVKUB2.pdfThe high resolution direct laser lithography system Dilase 650 offers you the possibility to work with one or two writing lasers, to be focused into one or two beam sizes ranging from 1µm to 50µm automatically switchables. It allows the writing on any type of substrate (photolithography masks, semiconductors, glass, polymers, crystals, flexible films...) over a surface area as large as 6 inches.
https://www.kloe-france.com/sites/default/files/2024-Product-Sheet-D650.pdfThe customisable laser lithography system Dilase 750 offers you the possibility to work with one, two or three writing laser sources over one, two or three laser beam widths ranging from 0,5µm to 50µm. It enables the writing on any type of substrate (photolithography mask, semiconductors, glass, polymers, cristal, flexible films...) over a standard working surface from 3 x 3mm², extendable up to 12" x 12" and even larger on demand.
https://www.kloe-france.com/sites/default/files/2024-Product-Sheet-D750.pdf
